A team of researchers from the Karlsruhe Institute of Technology (KIT) have developed a novel photoresist, a printing ink for two photon lithography, capable of self-assembly. As such, the material can be used to 3D print polymer microstructures with nanoscale porosities, producing a sort of lightweight nanofoam. By varying the printing parameters, the light scattering […]
from 3D Printing Industry https://bit.ly/2SxaEjq